e3511 Single-wafer Plasma Asher
- True downstream mw plasma process uses a heated platen
with temp up to 300 deg for extreme low damage Photoresist removal or light etch
- Process assisted with 1kw heat lamp for better uniformity and ashrate. Solid State lamp controller eliminates calibration requirement.
- Power supply system with DC-DC power supplies for clean power
- Wafer cooling station with touch wafer sensor, works with substrates, glass etc.
- Advanced Hine Hatm-5 pick and place robot
- Gerling GL139 1.2kw microwave generator
- Mititoyo 3 stub mw tuning
- 6 pole mw applicator
- Automatic photoemission end-point detection